Formulated to respect each type of skin, My "Softness & Radiance" Purifying Mask is an ideal pore purifying treatment to revive the skin's natural radiance.
Its unique composition enriched with white mineral clay, aloe true and shea butter gives the skin an unparalleled feeling of comfort for a visible result and a softened skin.
- mineral clays, key components of this mask, are known to deeply cleanse the skin and absorb excess sebum where the skin needs it.
The association ofaloe true that Butter de karité offers unparalleled hydration, for a purifying treatment that does not dry out the skin.
Technology « CLEAN'OYA® Lite ", specially developed to be suitable for sensitive skin, offers the skin a deep cleansing, for visibly tightened pores.
This treatment, specifically developed for black, dark and mixed skin, combines perfectly with My “Exfoliating Cleansing” Gel and will be your beauty ally to regain clean, smooth and radiant skin.
For all skin types.
How to enjoy its benefits?
Apply My "Softness & Radiance" Purifying Mask in a thin and uniform layer all over the face while avoiding the eye area. Leave on for 10 to 15 minutes, then rinse thoroughly with water. Use once or twice a week, morning or evening. Avoid contact with the eyes, if necessary rinse thoroughly with water.
For best results, use My "Gentle & Radiance" Purifying Mask after exfoliating your skin with My "Exfoliating Cleansing" Gel.
The combination of these two treatments offers optimal effectiveness of the active ingredients for visibly smoother, clearer and brighter skin.
Aqua (Water), Kaolin, Caprylic / Capric Triglyceride, Glycerin, Cetearyl Alcohol, Butylene Glycol, CI 77891 (Titanium Dioxide), Xylitylglucoside, Butyrospermum Parkii (Shea) Butter, Magnesium Aluminum Silicate, Squalane, Lactococcus Ferment Lysateis, Juoe Leaf Barbarice Powder, Helianthus Annuus (Sunflower) Seed Oil, Enantia Chlorantha Bark Extract, Xylitol, Anhydroxylitol, Ethylhexylglycerin, Xanthan Gum, Glucose, Tocopherol, Tocopheryl Acetate, Oleanolic Acid, Ceteareth-20, Hydroxyethylglycerin, Acrylcolymer Gum, Tocopherol, Tocopheryl Acetate, Oleanolic Acid, Ceteareth-60, HydroxyethylcolymidlyAcrylyllycidolylcyllycidol Glycerol, CethylproxyCopyllycidol-XNUMX, HydroxyethylcolymidlyAcrylicol, Lactyethylcyllycidol, Lactyethylcyllycidol, Acetylcyl-XNUMX , Chlorphenesin, PolysorbateXNUMX, Sodium Chloride, Citric Acid, Sodium Benzoate, Parfum (Fragrance), Sodium Hydroxide, Sodium Citrate, Sorbitan Isostearate.
Based on a new technology "CLEAN'OYA® Lite", formulated without silicone and composed of 95% natural ingredients, My Purifying Mask "Softness & Radiance" rids the skin of its impurities for a clear and luminous complexion.